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27
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35
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59
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61
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67
https://www.spiedigitallibrary.org/journals/Journal-of-MicroNanolithography-MEMS-and-MOEMS/volume-12/issue-04/043002/Characterization-of-wafer-geometry-and-overlay-error-on-silicon-wafers/10.1117/1.JMM.12.4.043002.pdf
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68
https://cyberleninka.org/article/n/972132
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69
https://semiengineering.com/die-to-die-stress-becomes-a-major-issue/
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70
https://en.wikipedia.org/wiki/Residual_stress
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71
https://www.cambridge.org/core/services/aop-cambridge-core/content/view/C569B6E94A5EA7E85F90DF10FEE00208/S1946427400370415a.pdf/thermal-stresses-in-passivated-alsicu-lines-from-wafer-curvature-measurement.pdf
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https://elib.uni-stuttgart.de/bitstream/11682/1425/1/Mechanisms_of_intrinsic_stress_formation_in_thin_film_systems.pdf
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80
https://transducer-research-foundation.org/technical_digests/HiltonHead_2000/hh2000_0316.pdf
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https://www.hindawi.com/journals/amse/2017/4903924/
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https://siliconsemiconductor.net/article/95474/Role_of_process-induced_wafer_geometry_changes_in_advanced_semiconductor_manufacturing
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https://www.academia.edu/1804508/Thin_films_stress_extraction_using_micromachined_structures_and_wafer_curvature_measurements
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https://www.physicsforums.com/threads/how-to-calculate-maximum-surface-pressure-a-silicon-wafer-can-withstand.772574/
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http://mdl.pme.nthu.edu.tw/NTHU_PME_lab_ENG/papers/5.pdf
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https://www.stresstech.com/stresstech-bulletin-12-measurement-methods-of-residual-stresses/
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https://www.leica-microsystems.com/science-lab/characterization-of-thin-films-using-high-definition-confocal-microscopy/
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